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兵工学报 ›› 2015, Vol. 36 ›› Issue (9): 1736-1742.doi: 10.3969/j.issn.1000-1093.2015.09.019

• 论文 • 上一篇    下一篇

阳极偏置法摩擦辅助硫酸盐电铸铜

任建华, 朱增伟, 沈春健, 唐小聪, 朱荻   

  1. (南京航空航天大学 机电学院, 江苏 南京 210016)
  • 收稿日期:2014-12-23 修回日期:2014-12-23 上线日期:2015-11-20
  • 通讯作者: 任建华 E-mail:renjianrun@163.com
  • 作者简介:任建华(1986—), 男, 博士研究生
  • 基金资助:
    新世纪优秀人才支持计划项目(NCET-10-0074); 全国优秀博士学位论文作者专项资金项目(201138)

Abrasive-assisted Copper Electroforming Process with Offset Anode in Sulfate Bath

REN Jian-hua, ZHU Zeng-wei, SHEN Chun-jian, TANG Xiao-cong, ZHU Di   

  1. (College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and
  • Received:2014-12-23 Revised:2014-12-23 Online:2015-11-20
  • Contact: REN Jian-hua E-mail:renjianrun@163.com

摘要: 为了将机械摩擦应用于药型罩的硫酸盐电铸铜,基于铜离子两步还原原理,提出了一种新摩擦辅助方式的电铸铜工艺。将阴极卧式放置,在阴极框内填充适量不导电游离微珠至芯模水平中线左右,同时阳极偏置于没有微珠的上部。电铸过程中,铜离子在正对阳极的较强电场区域先沉积,然后芯模的旋转使沉积层被微珠摩擦,从而改善了辅助摩擦的电沉积过程,避免毛刺的产生,提高电铸层质量。试验结果表明:在较低转速下可以更好地利用铜离子两步还原原理及阳极偏置法,让铜离子先沉积,再被硬质微珠摩擦,在无添加剂的硫酸盐溶液中得到表面平整的铜沉积层,同时电铸层的晶粒和微观组织得到细化和改善;当转速为5 r/min时,得到显微硬度为139 HV,抗拉强度为333 MPa的铜电铸层;当采用不溶性阳极时,可进一步增强电铸铜的机械性能,抗拉强度达到460 MPa. 为了将机械摩擦应用于药型罩的硫酸盐电铸铜,基于铜离子两步还原原理,提出了一种新摩擦辅助方式的电铸铜工艺。将阴极卧式放置,在阴极框内填充适量不导电游离微珠至芯模水平中线左右,同时阳极偏置于没有微珠的上部。电铸过程中,铜离子在正对阳极的较强电场区域先沉积,然后芯模的旋转使沉积层被微珠摩擦,从而改善了辅助摩擦的电沉积过程,避免毛刺的产生,提高电铸层质量。试验结果表明:在较低转速下可以更好地利用铜离子两步还原原理及阳极偏置法,让铜离子先沉积,再被硬质微珠摩擦,在无添加剂的硫酸盐溶液中得到表面平整的铜沉积层,同时电铸层的晶粒和微观组织得到细化和改善;当转速为5 r/min时,得到显微硬度为139 HV,抗拉强度为333 MPa的铜电铸层;当采用不溶性阳极时,可进一步增强电铸铜的机械性能,抗拉强度达到460 MPa.

关键词: 电化学工程, 电铸铜, 力学性能, 摩擦辅助, 阳极偏置

Abstract: Based on the theory of two-step reduction of cupric ions in copper electrodeposition, a novel abrasive method is proposed for the abrasive-assisted copper electroforming process to make mechanical friction in sulfate solution bath. A cathode mandrel is employed to revolve in horizontal type, and the cathode basket is filled with moderate non-conductive free beads. Additionally, an offset anode is just fitted on the upper side corresponding to the area without free beads. During the electrodepositing process, for the lower electric field intensity with nonconductive free beads shielding the lower semicircle surface of the mandrel evenly, the copper ions deposit firstly on the cathode area facing the anode, and then the nonconductive and the hard beads are forced to continuously and slightly polish the coverage area on cathode surface. Consequently, the abrasive-assisted electrodeposition process is improved and the quality of the electroformed layer is improved,refraining from the burrs. The result shows that the copper ions are electrodeposited firstly by the theory of two-step reduction of cupric ions with offset anodes, and then the deposits are polished in the copper electrodeposition process. Moreover,a smooth-surfaced electroformed copper layer prepared in an abrasive-assisted way at low speed is achieved from sulfate acid bath without additives, which microstructure had been effectively modified. The grains are also refined at the same time. The microhardness of the electroformed layer is up to 139 HV, and the tensile strength is about 333 MPa at a revolving speed of 5 r/min. When insoluble anode is employed, the mechanical property of the coating is improved significantly. Eventually, a copper electroformed layer with tensile strength of 460 MPa is produced.

Key words: eletro-chemistry engineering, copper electroforming, mechanical property, abrasive-assisted, offset anode

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