[1] Sung W L, Lai W C, Chen C C, et al. Micro devices integration with large-area 2D chip-network using stretchable electroplating copper spring [C]∥Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems. San Francisco, US: IEEE Robotics and Automation Society, 2014:1135-1138. [2] Miller R A, Tai Y C . Micro-machined electromagnetic scanning mirrors [J]. Optical Engineering, 1997, 36(5):1399-1407. [3] Youn S W, Takahashi M, Goto H,et al. Fabrication of micro-mold for glass embossing using focused ion beam, femto-second laser, eximer laser and dicing techniques [J]. Journal of Materials Processing Technology, 2007, 187(4):326-330. [4] Jing X M, Chen D, Fang D M, et al. Multi-layer microstructure fabrication by combining bulk silicon micromachining and UV-LIGA technology [J]. Microelectronics Journal, 2007, 38(1): 120-124. [5] 冯鹏洲,朱继南,吴志亮,等. 美国典型MEMS引信安全保险装置分析[J]. 探测与控制学报, 2007, 29(5): 26-30,33. FENG Peng-zhou, ZHU Ji-nan, WU Zhi-liang, et al. Analysis of US typical MEMS fuze safety and arming device[J]. Journal of Detection and Control, 2007, 29(5): 26-30, 33. (in Chinese) [6] 黄新龙,熊瑛,陈光焱,等. UV-LIGA技术制作微型螺旋形加速度开关[J]. 光学精密工程, 2010, 18(5):1152-1158. HUANG Xin-long, XIONG Ying, CHEN Guang-yan, et al. Fabrication of micro spiral acceleration switch using UV-LIGA technology [J].Optics and Precision Engineering, 2010, 18(5):1152-1158. (in Chinese) [7] Saotome Y, Yokote S, Okamato T, et al. Design and insitu mechanical testing system for probe card/ UV-LIGA-Ni microspring[C]∥Proceedings of the Sixteenth Annual International Conference on Micro Electro Mechanical Systems. Kyoto, Japan: IEEE Robotics and Automation Society, 2003: 670-673. [8] 冯鹏洲. 微机电安全与解除保险装置关键技术研究[D]. 南京:南京理工大学, 2008. FENG Peng-zhou. Research on the key technology of MEMS fuze safety & arming device [D]. Nanjing: Nanjing University of Science and Technology, 2008. (in Chinese) [9] Saito N, Murata N, Tamakawa K, et al. Evaluation of the crystallinity of grain boundaries of electronic copper thin films for highly reliable interconnections [C]∥Proceedings of IEEE 62nd Electronic Components and Technology Conference. San Diego, US: Institute of Electrical and Electronics Engineers, 2012:1153-1158. [10] Zhang S D, Sakane M, Nagasawa T, et al. Mechanical properties of copper thin films used in electronic devices [J]. Procedia Engineering, 2011, 10(7):1497-1502. [11] 苏飞,张铮,熊吉,等. 电镀铜薄膜力学性能的实验研究[J]. 实验力学,2012,27(5):565-569. SU Fei, ZHANG Zheng, XIONG Ji, et al. Experimental study of mechanical properties for electroplated copper film [J]. Journal of Experimental Mechanics, 2012, 27(5):565-569. (in Chinese) [12] 关丽雅,郑秀华,王富耻,等. 脉冲参数对电铸铜组织形态和硬度的影响[J]. 电镀与精饰,2008,30(6):1-5. GUAN Li-ya, ZHENG Xiu-hua, WANG Fu-chi, et al. Influence of pulse parameters on the structure and hardness of electroforming copper [J]. Plating and Finishing, 2008, 30(6):1-5. (in Chinese) [13] 邵伟平,张继桃,郝永平,等. 基于MEMS镍平面微弹簧尺寸误差分析[J]. 机械设计,2012,29(8):80-82. SHAO Wei-ping, ZHANG Ji-tao, HAO Yong-ping, et al. Analysis of dimension tolerance for MEMS Ni planar micro spring [J]. Journal of Machine Design, 2012, 29(8):80-82. (in Chinese) [14] 李华,石庚辰,何光. MEMS加工误差对微弹簧力学特性的影响分析[J]. 压电与声光,2009,31(5):735-737. LI Hua, SHI Geng-chen, HE Guang. Analysis of effect of MEMS fabrication error on the microspring mechanical property [J]. Piezoelectrics and Acoustooptics, 2009, 31(5):735-737. (in Chinese) [15] 石庚辰,李华. 基于LIGA(准LIGA)工艺的微机械零件公差问题[J]. 功能材料与器件学报,2008,14(2):380-383. SHI Geng-chen, LI Hua. Tolerance of MEMS part based on LIGA (quasi- LIGA) technology [J]. Journal of Functional Materials and Devices, 2008, 14(2):380-383. (in Chinese) [16] Ruzzu A, Matthis B. Swelling of PMMA-structures in aqueous solutions and room temperature Ni-electroforming [J]. Microsystem Technologies, 2002, 8(2):116-119. [17] 徐良朗. 超细晶铜的电铸工艺优化研究[D].南京:南京理工大学,2006. XU Liang-lang. Study on optimization of electroforming process of ultrafine grained copper [D].Nanjing:Nanjing University of Science and Technology, 2006. (in Chinese) [18] 邵力耕. 脉冲微纳米电铸相关问题的研究[D]. 大连:大连理工大学,2011. SHAO Li-geng. Research on pulse micro-nano electroforming relevant questions [D]. Dalian: Dalian University of Technology, 2011. (in Chinese) [19] 易光斌. 电解铜箔组织性能及其翘曲产生机理研究[D]. 南昌:南昌大学,2014. YI Guang-bin. Mechanism on warping and microstructure and mechanical properties of electrolytic copper foils [D]. Nanchang: Nanchang University, 2014. (in Chinese) [20] 吕欣蕊. 电沉积铜箔的工艺参数和拉伸性能研究[D]. 天津:天津大学,2010. LYU Xin-rui. Study on processing parameters and tensile properties of electrodeposited copper foil [D]. Tianjin: Tianjin University, 2010. (in Chinese) [21] 徐惠宇,朱荻,曲宁松. 电铸沉积层性能的试验研究[J].电加工与模具,2001(1):18-20. XU Hui-yu, ZHU Di, QU Ning-song. Experimental study of properties for electroforming deposition layer [J]. Electromachining and Mould, 2001(1):18-20. (in Chinese) [22] 刘仁志. 实用电铸技术[M]. 北京:化学工业出版社, 2007. LIU Ren-zhi. Practical electroforming technology [M].Beijing: Chemical Industry Press, 2007. (in Chinese) [23] Chen F, Chen S, Dong X H, et al. Size effects on tensile strength of aluminum-bronze alloy at room temperature[J]. Materials and Design, 2015, 85:778-784. |