A method of Stitching Digital Camouflage Patterns on Different Planes Based on Texture Synthesis and Best Seam Line Algorithm

doi:10.3969/j.issn.1000-1093.2019.03.027

Abstract

Abstract: A discontinuously transitional color appears in the connection part between different planes when 2D digital camouflage pattern is applied on a 3D target surface. To solve this problem, a digital camouflage stitching method is proposed based on texture synthesis and best seam line algorithm. The texture synthesis technology is used to create naturally transitional extended digital camouflage pattern, thus constructing a fake overlap region for digital camouflage pattern, and searching the best seam line in the overlap region. And then the patterns to be stitiched are tailored and stitched together to achieve the seamless stitching of digital camouflage pattern. The qualitative and quantitative methods are used to eva- luate the stitching result. Experimental results show that the proposed method can effectively eliminate the significant gaps in stitched camouflage pattern, and make it more natural. Key

Key words: digitalcamouflagepattern, stitching, texturesynthesis, bestseamline

CLC Number:

TP391.413

LI Zhonghua， YU Jun， HU Zhiyi， KANG Qinyu， GAO Shouyi， LIAN Zhichao， XIAO Feng. A method of Stitching Digital Camouflage Patterns on Different Planes Based on Texture Synthesis and Best Seam Line Algorithm[J]. Acta Armamentarii, 2019, 40(3): 666-672.

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