Research on Material Removal Model of Optical Elements Based on Fast Polishing Technology

doi:10.3969/j.issn.1000-1093.2017.03.015

Abstract

Abstract: In order to accurately control the material removal in polishing stage, and achieve the deterministic polishing processing of toptical element, the quantitative mean volume removed by a single particles per unit time and the number of the active particles on the wafer-pad interface are obtained from the force applied on an abrasive particle and the number of all particles on the wafer-pad contact area. An optical element fast polishing material removal model is established based on the analysis of fast polishing principle and fast polishing material removal mechanism. Research shows that, under the experimental conditions of different polishing liquids, polishing pads and optical elements, the theoretically predicted results of the material removal model are well coincident with the experimental results, and the error of material removal can be controlled within 9%. The proposed model is verified to be suitable for the optical element fast polishing technology, thus deterministically controling the fast polishing time and efficiency.Key

Key words: manufacturingtechnologyandequipment, opticalelement, fastpolishing, materialremovalmodel

CLC Number:

TN205

LIN Tao, YANG Wei, WANG Jian. Research on Material Removal Model of Optical Elements Based on Fast Polishing Technology[J]. Acta Armamentarii, 2017, 38(3): 527-533.

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第38卷
第3期2017 年3月兵工学报ACTA
ARMAMENTARIIVol.38No.3Mar.2017

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