Influence on Flow Field of Hot Launch in a W-Shaped Underground Space by Water Injection

doi:10.12382/bgxb.2022.0014

Abstract

Abstract:

The water spray system is used to improve the flow field in the thermal launch process of missiles in underground spaces, with the aim of reducing the peak value of pressure pulse, alleviating pressure oscillation, and reducing the temperature of flow field through “decompression and cooling”. In this study, a gas-liquid two-phase flow control equation is established by combining the three-dimensional viscous compressible Navier-Stokes equation, mixture multiphase flow model, and phase change model. The mathematical model and numerical method are validated using gas jet scaling test data. Computational fluid dynamics (CFD) numerical calculation method is used to analyze the influence of the water spray system on the flow field environment during the missile’s underground space launch process. The results show that the environmental characteristics of the flow field in the underground space during the thermal launch of the missile are effectively improved by establishing a water spray system at the bottom of the W-shaped underground space. The water spray system has a good suppression effect on the initial overpressure phenomenon. The bottom pressure oscillation is reduced from 8 times to 4 times. The pressure changes slowly up and down at 1 atm, with the maximum pressure only about 1.20×10⁵Pa. The initial overpressure peak is reduced, and the frequency and amplitude of the pressure oscillation are reduced, achieving the decompression effect. Through the process of violent vaporization of liquid water and momentum exchange, the phenomenon of gas backsplash is strongly and effectively suppressed by the water spray system. The gas is confined at the bottom of the cylinder, and the maximum temperature at the bottom of the missile is reduced from 3000K to about 400K, achieving the “cooling” effect.

Key words: W-shaped underground space, gas jets, water spray system, multiphase flow, evaporation

ZHANG Manman, JIANG Yi, SHI Shaoyan, DENG Yueguang. Influence on Flow Field of Hot Launch in a W-Shaped Underground Space by Water Injection[J]. Acta Armamentarii, 2023, 44(4): 1158-1170.

Figures/Tables 24

Fig.1 Flowchart of the calculation process of CFD control equations

Fig.2 Geometric model of the W-shaped underground launcher

Fig.3 Model of water injection in the underground launcher

Fig.4 Schematic diagram of boundary conditions of the launcher section

Fig.5 Meshing model of the launcher

Fig.6 Schematic of the experiment system

Fig.7 Temperature measurement points of the bottom plate

Fig.8 Comparison of wave structures acquired by test (left) and numerical simulation (right)

Fig.9 Comparison of the experimental measurement and numerical simulation values

Table 1 Basic parameters of different grid numbers

参数	网格数量/万
参数	95	139	260	640
最小网格尺寸/mm	5.0	2.5	1.7	1.2
计算工时/h	60	96	144	240

Fig.10 Pressure change at the bottom of the launcher

Fig.11 Pressure change at the bottom of the missile

Fig.12 Pressure distribution in the flow field

Table 2 Monitoring point information

序号	监测点名称	坐标值/m	位置
1	missile-bottom	(0,0,0.12)	导弹底部的中心点
2	point-iop	(0,0,-0.16)	承重层与导流锥顶端连线的中点

Table 3 Comparison of the first three pressure peaks of the monitoring point missile-bottom

工况	压强峰序号	时间/ms	压强峰值/10⁵Pa
	1	0.240	2.695
无喷水	2	0.818	3.677
	3	1.488	2.358
	1	0.280	1.998
有喷水	2	0.830	2.390
	3	1.550	1.240

Fig.13 Pressure change during initial,development and stable stage of monitoring points

Fig.14 Gas distribution in the flow field

Table 4 Additional monitoring point information

监测点名称	角度/(°)	高度/m	位置
missile-90-1	90	0.3	导弹侧面的底部

Fig.15 Temperature change of the monitoring points

Fig.16 Temperature distribution in the flow field (The black contour refers to the vaporization reaction rate of 0.01kg/(m3·s))

Table 5 Liquid water vaporization reaction rate at typical moments and the highest position z value where the vaporization reaction rate occurs in the middle area of the jet

典型时刻/ms	液态水汽化速率/(kg·m^-3·s^-1)		最高位置 z值/mm
典型时刻/ms	最大值	最小值	最高位置 z值/mm
0.2	0.097×10^-8	-2.768×10^-8	81.6
0.8	0.358×10^-7	-2.302×10^-7	75.6
2.0	0.649×10^-7	-2.735×10^-7	63.6
5.3	1.883×10^-7	-5.200×10^-7	-8.8
19.0	1.758×10^-6	-3.006×10^-6	65.0
40.0	1.516×10^-7	-6.310×10^-7

Fig.17 Temperature contours of the contact surface

Fig.18 Proportional change of vaporized water in the flow field

Fig.19 Change process of the contact surface

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